Megasonic Single-/Dual-Nozzle

Concentration on the essentials – contact-less cleaning

The transducer in the Megasonic Nozzle generates a Megasonic wave, which is transmitted through a flowing liquid (e.g.: DI-water) to the surface of the substrate. The Megasonic energy is concentrated on a small point of 2 or 4 mm.
SONOSYS® Megasonic nozzles are offered in the frequencies of NEW: 600 kHz / 1 MHz / 2 MHz / 3 MHz / 4 MHz and 5 MHz.

This tankless Megasonic Nozzle system provides advanced non contact cleaning processes.

Application:
Cleaning of Single Wafers, Masks, LCD‘s, Substrates and Micro Electro Mechanical Systems (MEMS), and with 600 kHz also larger particles in the optic industry, from medical devices and sensors.