Megasonic cleaning systems for micro- and nanostructures
About us
From our founding to the present day
SONOSYS® offers solutions in the field of ultrasonic and megasonic cleaning for various applications. The focus is on higher frequencies between 400kHz and 5MHz for cleaning the smallest particles and contaminants down to the nanometer range.
The products are entirely developed in-house by SONOSYS®, from the generator and the sound fields consisting of patented piezo ceramics to the entire megasonic system. After the company was founded in 1995 by Johann Brunner and Joachim Straka, development and production were established in accordance with German and European standards and continuously expanded.
The solutions meet the highest quality and reliability requirements, such as those demanded in semiconductor, MEMS, and LIGA technology. The focus is always on customer requirements and customer satisfaction. In recent years, for example, there has been an increasing focus on gentle but efficient cleaning of microstructures, which is excellently served by SONOSYS® solutions.
True to the company motto, “Mastering nanoClean together,” customer requirements are examined directly and indirectly (via OEMs) in order to ultimately achieve the best cleaning results down to the nanometer range. Over the past three decades on the market, SONOSYS® has delivered more than 4,500 systems to numerous well-known customers in the semiconductor and MEMS industries worldwide.
Cooperations
Performance optimization
Special expertise and synergies arise from close cooperation between our own research and development laboratories and world-renowned institutes and institutions such as the Fraunhofer Society, IMEC in Belgium, Otto von Guericke University Magdeburg (IMOS) and the Karlsruhe Research Center (IMT). This contributes significantly to ensuring that our solutions in the field of cleaning systems for micro- and nanostructures are not only state-of-the-art, but also forward-looking.
